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F.S. (Fatemeh) Minaye Hashemi

Faculty of Science
Van 't Hoff Institute for Molecular Sciences

Visiting address
  • Science Park 904
Postal address
  • Postbus 94157
    1090 GD Amsterdam
Contact details
Social media
  • Background and Research Interests

    I am a research assistant professor at the University of Amsterdam Faculty of Sciences. While my background is in Physics (BSc and MSc) and Materials Science and Engineering (MSc and PhD), I have always been fascinated by what happens at the nanometer scale on the surfaces. That’s why throughout my academic carrier, I have always explored methods for deposition, modification and characterization of thin films. My research ranges from thin film photovoltaics, and semiconductor processing, to the integration of thin films into devices for energy and sensing applications.

    My work at UvA (funded by NWO Veni grant) is focused on developing microporous thin films for sensing and energy applications. The porous films of my interest are a part of metal-organic framework (MOF) materials that are typically synthesized on a large scale and via chemical routes in powder forms. When we aim to integrate this versatile class of materials into devices, new deposition approaches compatible with the devices have to be employed. Our expertise is to make MOFs via vapor phase deposition techniques that:

    • use more environmentally-friendly process conditions
    • are compatible with the industrial process of device fabrication
    • give excellent control over the deposition condition and thin film properties
    • reduce the processing time from a few days to a few hours
    • can be integrated into various device technologies for various applications

    While our work starts from chemistry at the surfaces and interfaces of thin films, our group is also well connected with the sensing industry allowing us to start testing the developed materials for real-life applications.

    In addition to my role at UvA, I am also a scientist at the TNO Energy Transition Unit working on the advancement in the Solar Cell research and industry (LinkedIn)

    (left) MOF structure sensing mechanism (right) MOF thin film sensing device
  • Education

    Sep 2012- Sep 2016        PhD, Materials Science and Engineering, Stanford University, USA

    Sep 2012- Sep 2014        MSc, Materials Science and Engineering, Stanford University, USA

    Sep 2010- Aug 2012        MSc, Physics, EPFL, Switzerland

    Sep 2005- Sep 2009        BSc, Physics, Sharif University of Technology, Iran

  • Selected Publications

    For the full list of publications please check my Google Scholar Profile.

    • Self-Correcting Process for High-Quality Patterning by Atomic Layer Deposition F. S. M. Hashemi, C. Prasittichai and S. F. Bent, ACS Nano 9 (9), 8710-8717, 2015.
    • A new resist for area selective atomic and molecular layer deposition on metal-dielectric patterns F. S. M. Hashemi, C. Prasittichai, S. F. Bent, The Journal of Physical Chemistry C, 118, 10957−10962, 2014.
    • A New Process for Area-Selective Deposition on 3D Nanostructures by Ion Implantation, W. H. Kim, F. S. M. Hashemi, A. J. M. Mackus, J. Singh, Y. Kim, D. B. Semple, Y. Fan, T. K. Osborn, L. Godet and S. F. Bent, ACS Nano, 10, 4451−4458, 2016.
    • Atomic Layer Deposition of ZnO on InP Quantum Dot Films for Charge Separation, Stabilization, and Solar Cell Formation R. W. Crisp, F. S. M. Hashemi, J. Alkemade, N. Kirkwood, G. Grimaldi, S. Kinge, L. D. A. Siebbeles, J. R. van Ommen, A. J. Houtepen, Advanced Materials Interfaces, 7, 4, 2020. 
    • Selective Deposition of Dielectrics: Limits and Advantages of Using Thiols on Metal-Dielectric Patterns, F. S. M. Hashemi, B. Birchansky and S. F. Bent, ACS Applied Materials and Interfaces, 8 (48), 33264-33272, 2016.
    • Sequential Regeneration of Self-Assembled Monolayers for Highly Selective Atomic Layer Deposition, F. S. M. Hashemi and S. F. Bent, Advanced Materials Interfaces, 3 (21), 1600464, 2016.
  • Openings
  • Ancillary activities
    • TNO
      Employee- Part time Scientist