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Van 't Hoff Institute for Molecular Sciences null

NWO XS grant for Fatemeh Hashemi

For the deposition of microporous thin films integrated into chemical sensors

26 April 2022

Dr Fatemeh Hashemi of the Van 't Hoff Institute for Molecular Sciences has been awarded a 50,000 euro grant in the Open Competition XS call of the Dutch Research Council NWO (Domain Science). She will use the grant to develop the deposition of microporous thin films with tunable design at the nanometer scale, directly onto integrated circuits.
Dr Fatemeh Hashemi is a research assistant professor and Veni laureate at the Functional Materials research group headed by Dr Stefania Grecea. Photo: HIMS.

Smart detection of harmful gases is essential for stopping air quality deterioration. The major players for sensing gases require high energy for operation and face difficulties in miniaturizing the sensor packages. Thus, there remains a significant challenge in the development of new technologies for materials and processes with lower energy consumption, increased sensitivity, and sensors miniaturization. The use of devices with lower energy consumption and solvent-free deposition of microporous thin films on them enables significant power reduction for sensing. The aim of Hashemi's project is to introduce a versatile vapour-based approach for the deposition of microporous thin films with tunable design at the nanometer scale, directly on integrated circuits, opening up the possibility of an integrated process for fabricating energy-efficient microelectronic sensors.

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